PHOTOMASK MATERIALS REVIEW.

被引：0
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作者：
O'Neill, Timothy G.
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来源：
Semiconductor International | 1981年 / 4卷 / 08期
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摘要：
With decreasing linewidths, photomask materials have changed from inexpensive glass substrates coated with photographic emulsions to expensive low thermal expansion substrates coated with chrome. Along with material changes, specifications have been tightened requiring defect-free substrates that are as flat as possible and coatings that have consistent quality. The result is more expensive, higher yielding photomasks.
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页码：81 / 84
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