Bilayer SiNX/diamond films for X-ray lithography mask

被引：0
|
作者：
Huang, Bohr-Ran [1 ]
Sheu, Jeng-Tzong [2 ]
Wu, Chia-Haur [1 ]
机构：
[1] Inst. of Electronics and Info. Eng., Natl. Yunlin Univ. Sci. and Technol., 123 University Road, Section 3, Touliu, Yunlin, 640, Taiwan
[2] Synchrt. Radiation Research Center, Hsinchu Sci.-Based Industrial Park, NO. 1 R. and D. Road VI, Hsinchu 300, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 11期
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页码：6530 / 6534
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