Preparation of ZnS:Tm films by metalorganic chemical vapor deposition using thulium β-diketonates as dopants

被引:0
|
作者
Hara, Kazuhiko [1 ]
Tominaga, Satoshi [1 ]
Takano, Atsushi [1 ]
Dantani, Kyoji [1 ]
Yoshino, Junji [1 ]
Kukimoto, Hiroshi [1 ]
机构
[1] Tokyo Inst of Technology, Yokohama, Japan
来源
关键词
20;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Isotopic study on metalorganic chemical vapor deposition of manganite films
    Nakamura, Toshihiro
    SURFACE & COATINGS TECHNOLOGY, 2013, 230 : 213 - 218
  • [32] Preparation of PbZrO3 thin films by plasma enhanced metalorganic chemical vapor deposition
    Lee, WG
    Woo, SI
    JOURNAL OF MATERIALS SCIENCE LETTERS, 2003, 22 (23) : 1677 - 1678
  • [33] THE PREPARATION OF ZNS THIN-FILMS ON AN INDIUM TIN OXIDE GLASS SUBSTRATE BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    LI, JW
    CHIANG, JD
    SU, YK
    YOKOYAMA, M
    JOURNAL OF CRYSTAL GROWTH, 1994, 137 (3-4) : 421 - 426
  • [34] PREPARATION OF CO FERRITE FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    FUJII, E
    TORII, H
    TAKAYAMA, R
    HIRAO, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (01): : 130 - 131
  • [35] Preparation of AIN: Mn films by metalorganic chemical vapor deposition for thin film electroluminescent devices
    Hara, K
    Sato, A
    Azumada, K
    Atsumori, T
    Shiratori, M
    5TH INTERNATIONAL CONFERENCE ON NITRIDE SEMICONDUCTORS (ICNS-5), PROCEEDINGS, 2003, 0 (07): : 2274 - 2277
  • [36] PREPARATION OF BATIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION USING ULTRASONIC SPRAYING
    KIM, IT
    LEE, CH
    PARK, SJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (9B): : 5125 - 5128
  • [37] Preparation of platinum thin films by metalorganic chemical vapor deposition using oxygen-assisted decomposition of (ethylcyclopentadienyl)trimethylplatinum
    Sun, HJ
    Choi, ES
    Kweon, SY
    Kim, NK
    Yeom, SJ
    Roh, JS
    Sohn, HC
    Kim, JW
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (5A): : L624 - L627
  • [38] Metalorganic chemical vapor deposition of InAlP using tertiarybutylphosphine
    Hori, Hisao
    Kawakyu, Yoshito
    Ishikawa, Hironori
    Mashita, Masao
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (8 A): : 1343 - 1344
  • [39] Metalorganic chemical vapor deposition of AlGaAs using tertiarybutylarsine
    Ishikawa, H
    Izumiya, T
    Mashita, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12A): : 6377 - 6378
  • [40] Metalorganic chemical vapor deposition of SrxTiyQz thin films by using mixed metal precursors
    Heo, JS
    Ryu, HK
    Cho, YS
    Kim, JC
    Moon, SH
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2006, 23 (01) : 153 - 158