Control of the magnetic film composition and uniformity in magnetron sputtering

被引：0
|
作者：
Zhu, Yaomin
Li, Xiaoyuan
Song, Xiaoping
Chen, Qiang
机构：
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2004年 / 33卷 / 07期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
9
引用
收藏
页码：775 / 777
相关论文
共 50 条
  • [1] Control of the magnetic film composition and uniformity in magnetron sputtering
    Zhu, YM
    Li, XY
    Song, XP
    Chen, Q
    RARE METAL MATERIALS AND ENGINEERING, 2004, 33 (07) : 775 - 777
  • [2] Magnetic field analysis for magnetron sputtering apparatus for accurate composition control
    Sakurai, Yutaka
    Nakajima, Ryo
    Nakamura, Hiroko
    SMART MATERIALS FOR SMART DEVICES AND STRUCTURES, 2009, 154 : 175 - +
  • [3] Improvement of titanium film uniformity by magnetron sputtering with electromagnetic coil design
    An, Qiaoru
    Jiang, Taoran
    Fang, Haisheng
    SURFACE & COATINGS TECHNOLOGY, 2024, 494
  • [4] Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target
    Wei Boyang
    Liu Dongmei
    Fu Xiuhua
    Zhang Jing
    Wang Yang
    Geng Yu
    ACTA OPTICA SINICA, 2021, 41 (07)
  • [5] Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target
    Wei B.
    Liu D.
    Fu X.
    Zhang J.
    Wang Y.
    Geng Y.
    Guangxue Xuebao/Acta Optica Sinica, 2021, 41 (07):
  • [6] Research of Film Uniformity on Vacuum Coating by Magnetron Sputtering with Multi-Sites
    Huang, Ying
    Gao, Shitie
    Liu, Meng
    MECHATRONICS AND INFORMATION TECHNOLOGY, PTS 1 AND 2, 2012, 2-3 : 1082 - 1087
  • [7] Controlling garnet film composition by magnetic-field-controlled radio frequency magnetron sputtering
    Furuya, A
    Baubet, C
    Yoshikawa, H
    Tanabe, T
    Hirono, S
    Yamamoto, M
    Tailhades, P
    Bouet, L
    Despax, C
    Presmanes, L
    Rousset, A
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) : 6776 - 6778
  • [8] Mechanism of the film composition formation during magnetron sputtering of WTi
    Shaginyan, LR
    Misina, M
    Kadlec, S
    Jastrabík, L
    Macková, A
    Perina, V
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05): : 2554 - 2566
  • [9] Control of hydroxyapatite film orientation by RF magnetron sputtering
    Kubota, Takafumi
    Hirata, Keishiro
    Takayanagi, Shinji
    Matsukawa, Mami
    2018 40TH ANNUAL INTERNATIONAL CONFERENCE OF THE IEEE ENGINEERING IN MEDICINE AND BIOLOGY SOCIETY (EMBC), 2018, : 4225 - 4228
  • [10] Influence of baffle on improving the thickness uniformity of thin film deposited by magnetron sputtering system
    Yu, He
    Jiang, Yadong
    Wang, Tao
    Wu, Zhiming
    Chen, Chao
    Jiang, Jing
    Jing, Hongjun
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
12345