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- [1] EFFECT OF DISLOCATIONS ON THE DIFFUSION OF GROUP IV ELEMENTS IN SILICON. Soviet Physics, Solid State (English translation of Fizika Tverdogo Tela), 1975, 16 (09): : 1729 - 1730
- [3] INFLUENCE OF COPPER ON THE DIFFUSION OF GOLD IN SILICON. Soviet Physics, Semiconductors (English translation of Fizika i Tekhnika Poluprovodnikov), 1976, 10 (12): : 1399 - 1400
- [4] DIFFUSION MECHANISM FOR III AND V GROUP ELEMENTS, IN SILICON IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1973, (04): : 157 - 158
- [5] INTRINSIC ELECTRIC-FIELD EFFECT ON DIFFUSION OF 5TH GROUP ELEMENTS IN SILICON FIZIKA TVERDOGO TELA, 1984, 26 (01): : 60 - 64
- [6] INFLUENCE OF DISLOCATIONS ON DIFFUSION OF IV GROUP ELEMENTS IN SILICON FIZIKA TVERDOGO TELA, 1974, 16 (09): : 2670 - 2673
- [8] ELECTRIC-FIELD IONIZATION OF PHOSPHORUS ATOMS IN SILICON. Soviet physics. Semiconductors, 1984, 18 (04): : 371 - 374
- [9] INFLUENCE OF OXYGEN ON RADIATION-STIMULATED DIFFUSION OF PHOSPHORUS IN SILICON. Soviet physics. Semiconductors, 1981, 15 (01): : 1 - 3
- [10] INFLUENCE OF AN INTERNAL ELECTRIC FIELD ON SIMULTANEOUS AND SUCCESSIVE DIFFUSION OF IMPURITIES IN SEMICONDUCTORS SOVIET PHYSICS SEMICONDUCTORS-USSR, 1968, 2 (01): : 84 - &