Growth, structure and electrical characteristics of epitaxial nickel silicide from chemically electroless Ni deposition on Si

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[1] Chang, Y.S.
[2] Hsieh, I.J.
[3] Lee, J.Y.
来源：
Chang, Y.S. | 1600年 / 25期
关键词：
Annealing Temperature - Epitaxial Silicides - Lattice Defects - Nickel Silicide;
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(Edited Abstract)
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