Raman study of tungsten disilicide formation in thin films

被引：0
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作者：
Chaix-Pluchery, O. [1 ]
Lucazeau, G. [2 ]
Meyer, F. [3 ]
Aubry-Fortuna, V. [3 ]
Madar, R. [1 ]
机构：
[1] LMGP, ENSPG, INPG, BP 46, 38402 St Martin d'Hères Cedex, France
[2] LEPMI, ENSEEG, INPG, BP 75, 38402 St Martin d'Hères Cedex, France
[3] IEF, Université Paris Sud, Bât. 220, 91405 Orsay Cedex, France
来源：
Vide: Science, Technique et Applications | 1997年 / 53卷 / 283 SUPPL.期
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页码：176 / 177
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