Measurement of fluorocarbon radicals generated from C4F8/H2 inductively coupled plasma: study on SiO2 selective etching kinetics

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作者：
Kubota, Kazuhiro [1 ]
Matsumoto, Hiroyuki [1 ]
Shindo, Haruo [1 ]
Shingubara, Shoso [1 ]
Horiike, Yasuhiro [1 ]
机构：
[1] Toyo Univ, Kawagoe, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 4 B期
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页码：2119 / 2124
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