Low temperature VUV enhanced growth of thin silicon dioxide films

被引:0
|
作者
机构
[1] Patel, Parthiv
[2] Boyd, Ian W.
来源
Patel, Parthiv | 1600年 / 46期
关键词
Semiconducting Silicon;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:1 / 4
相关论文
共 50 条
  • [31] Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films
    Martyniuk, M
    Antoszewski, J
    Musca, CA
    Dell, JM
    Faraone, L
    SMART MATERIALS AND STRUCTURES, 2006, 15 (01) : S29 - S38
  • [32] Simulation of fractal growth of thin films at low temperature
    Wu, FM
    Zhu, QP
    Shi, JQ
    Wu, ZQ
    CHINESE PHYSICS, 2000, 9 (01): : 49 - 54
  • [33] Nanostructured vanadium dioxide thin films with low phase transition temperature
    Chen, Sihai
    Ma, Hong
    Dai, Jun
    Yi, Xinjian
    APPLIED PHYSICS LETTERS, 2007, 90 (10)
  • [34] Growth of nanoporous silicon dioxide thin films using porous alumina substrates
    Chen, Feng
    Kitai, Adrian H.
    THIN SOLID FILMS, 2008, 517 (02) : 622 - 625
  • [35] Growth of quaterrylene thin films on a silicon dioxide surface using vacuum deposition
    Hayakawa, Ryoma
    Petit, Matthieu
    Wakayama, Yutaka
    Chikyow, Toyohiro
    ORGANIC ELECTRONICS, 2007, 8 (05) : 631 - 634
  • [37] ENHANCED GROWTH OF SILICON DIOXIDE FILMS BY PARALLEL-RESONANT RF PLASMAS
    KITAGAWA, A
    TAKEUCHI, M
    KASAGI, M
    HAYASHI, M
    KOUCHI, Y
    SUZUKI, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (07): : L1178 - L1180
  • [38] Very low-temperature growth of silicon thin films using chlorinated precursors and optical properties
    Linares, Javitt
    Lopez-Suarez, A.
    Ramos, C.
    Picquart, M.
    Garcia-Sanchez, M. F.
    Dutt, A.
    Santana, G.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 108
  • [39] Dynamics of low temperature PECVD growth of microcrystalline silicon thin films:: Impact of substrate surface treatments
    Losurdo, M.
    Giangregorio, M. M.
    Sacchetti, A.
    Capezzuto, P.
    Bruno, G.
    Carabe, J.
    Gandia, J. J.
    Urbina, L.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2006, 352 (9-20) : 906 - 910
  • [40] HYDRIDES AND HYDROXYLS IN THIN SILICON DIOXIDE FILMS
    BECKMANN, KH
    HARRICK, NJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) : 614 - &