Preparation of cubic C3N4 thin films by low-pressure plasma enhanced chemical vapor deposition

被引：0
|
作者：
机构：
来源：
Wuli Xuebao | / 6卷 / 1047-1051期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Formation of cubic C3N4 thin films by plasma enhanced chemical vapor deposition
    Zhang, Zhihong
    Guo, Huaixi
    Zhong, Guirong
    Yu, Feiwei
    Xiong, Qihua
    Fan, Xiangjun
    Thin Solid Films, 1999, 346 (01): : 96 - 99
  • [2] Formation of cubic C3N4 thin films by plasma enhanced chemical vapor deposition
    Zhang, ZH
    Guo, HX
    Zhong, GR
    Yu, FW
    Xiong, QH
    Fan, XJ
    THIN SOLID FILMS, 1999, 346 (1-2) : 96 - 99
  • [3] Structure and characteristics of C3N4 thin films prepared by rf plasma-enhanced chemical vapor deposition
    Wu, DW
    Fu, DJ
    Guo, HX
    Zhang, ZH
    Meng, XQ
    Fan, XJ
    PHYSICAL REVIEW B, 1997, 56 (08) : 4949 - 4954
  • [4] Structural characterization of C3N4 thin films synthesized by microwave plasma chemical vapor deposition
    Zhang, YP
    Gu, YS
    Gao, HJ
    Zhang, XF
    ACTA PHYSICA SINICA, 2001, 50 (07) : 1396 - 1400
  • [5] PLASMA CHEMICAL-VAPOR-DEPOSITION AND PROPERTIES OF HARD C3N4 THIN-FILMS
    VEPREK, S
    WEIDMANN, J
    GLATZ, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1995, 13 (06): : 2914 - 2919
  • [6] Growth of cubic boron nitride films by low-pressure inductively coupled plasma enhanced chemical vapor deposition
    Ichiki, Takanori
    Yoshida, Toyonobu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (7 B): : 4385 - 4388
  • [7] Corrosion resistance studies on α-C3N4 thin films deposited on pure iron by plasma-enhanced chemical vapor deposition
    Zhang, ZH
    Guo, HX
    Xu, Y
    Zhang, W
    Fan, XJ
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1999, 18 (09) : 685 - 687
  • [8] PREPARATION OF CUBIC BORON-NITRIDE FILMS BY LOW-PRESSURE INDUCTIVELY-COUPLED PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
    ICHIKI, T
    YOSHIDA, T
    APPLIED PHYSICS LETTERS, 1994, 64 (07) : 851 - 853
  • [9] Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition
    Gu, YS
    Zhang, YP
    Duan, ZJ
    Chang, XR
    Tian, ZZ
    Shi, DX
    Ma, LP
    Zhang, XF
    Yuan, L
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1999, 271 (1-2): : 206 - 212
  • [10] Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition
    Gu, Y.S.
    Zhang, Y.P.
    Duan, Z.J.
    Chang, X.R.
    Tian, Z.Z.
    Shi, D.X.
    Ma, L.P.
    Zhang, X.F.
    Yuan, L.
    Materials Science and Engineering A, 1999, 271 (1-2): : 206 - 212
12345