AFM investigation of silicon substrates for chemical vapour deposition of diamond films

被引：0

作者：

Fuchs, G.M. ^{[1
]}

Friedbacher, G. ^{[1
]}

Schwarzbach, D. ^{[1
]}

Bouveresse, E. ^{[1
]}

Prohaska, T. ^{[1
]}

Grasserbauer, M. ^{[1
]}

Haubner, R. ^{[1
]}

Lux, B. ^{[1
]}

机构：

[1] Vienna univ. technology, inst. analytical chemistry, Wien, Austria

来源：

Fresenius' journal of analytical chemistry | 1995年 / 353卷 / 5-8期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

AFM has been used to study surface modifications on silicon (100) substrates for CVD diamond deposition during bias pretreatment in a hot-filament reactor under various conditions. Both topographical images, force-distance measurements and chemical etching with HF have been implemented to obtain information on the processes involved. The results show, that the observed roughening, which strongly depends on the gas phase composition, is caused by chemical etching of the surface dominated by removal of elemental silicon via formation of silicon hydride.

引用

页码：698 / 701

共 50 条

[21] Evaluation of buffer layers for hot filament chemical vapor deposition diamond films on silicon substrates
Kumar, A
You, Q
Kapat, JS
Mangiaracina, A
Catletge, A
Vohra, Y
THIN SOLID FILMS, 1997, 308 : 209 - 214
[22] Nitrogen incorporation in diamond films homoepitaxially grown by chemical vapour deposition
Iakoubovskii, K
Adriaenssens, GJ
Vohra, YK
JOURNAL OF PHYSICS-CONDENSED MATTER, 2000, 12 (30) : L519 - L524
[23] Diamond thin films by microwave plasma chemical vapour deposition process
Barshilia, HC
Vankar, VD
IETE TECHNICAL REVIEW, 1998, 15 (1-2) : 65 - 70
[24] Microfabrication of diamond films by localized electron beam chemical vapour deposition
Kiyohara, S
Takamatsu, H
Mori, K
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2002, 17 (10) : 1096 - 1100
[25] Chemical vapour deposition and characterization of smooth {100}-faceted diamond films
Wild, C.
Koidl, P.
Mueller-Sebert, W.
Walcher, H.
Kohl, R.
Herres, N.
Locher, R.
Samlenski, R.
Brenn, R.
Diamond and Related Materials, 1993, 2 (2 -4 pt 1) : 158 - 168
[26] Si-doped diamond films prepared by chemical vapour deposition
Cui, Yu-xiao
Zhang, Jian-guo
Sun, Fang-hong
Zhang, Zhi-ming
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2013, 23 (10) : 2962 - 2970
[27] Diamond growth by chemical vapour deposition
Gracio, J. J.
Fan, Q. H.
Madaleno, J. C.
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (37)
[28] Chemical vapor deposition of diamond films on nonuniformly heated substrates
Ashurov, MK
Saidov, MS
Saliev, TM
LASERS IN SYNTHESIS, CHARACTERIZATION, AND PROCESSING OF DIAMOND, 1997, 3484 : 21 - 24
[29] XRD Studies on Residual Stress of the Diamond Films Grown using Hot Filament Chemical Vapour Deposition Technique on Silicon Nitride and Tungsten Carbide Substrates
Hamzah, Esah
Mi, Yong Tze
Fai, Kevin Chee Mun
GREEN TECHNOLOGIES FOR SUSTAINABLE & INNOVATION IN MATERIALS, 2013, 686 : 325 - 330
[30] GROWTH OF NANOCRYSTALLINE DIAMOND THIN FILMS ON TITANIUM SILICON CARBIDE USING DIFFERENT CHEMICAL VAPOUR DEPOSITION PROCESSES
Yang, S. L.
Yang, Q.
CANADIAN METALLURGICAL QUARTERLY, 2009, 48 (01) : 27 - 32

← 1 2 3 4 5 →