AFM investigation of silicon substrates for chemical vapour deposition of diamond films

被引：0

作者：

Fuchs, G.M. ^{[1
]}

Friedbacher, G. ^{[1
]}

Schwarzbach, D. ^{[1
]}

Bouveresse, E. ^{[1
]}

Prohaska, T. ^{[1
]}

Grasserbauer, M. ^{[1
]}

Haubner, R. ^{[1
]}

Lux, B. ^{[1
]}

机构：

[1] Vienna univ. technology, inst. analytical chemistry, Wien, Austria

来源：

Fresenius' journal of analytical chemistry | 1995年 / 353卷 / 5-8期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

AFM has been used to study surface modifications on silicon (100) substrates for CVD diamond deposition during bias pretreatment in a hot-filament reactor under various conditions. Both topographical images, force-distance measurements and chemical etching with HF have been implemented to obtain information on the processes involved. The results show, that the observed roughening, which strongly depends on the gas phase composition, is caused by chemical etching of the surface dominated by removal of elemental silicon via formation of silicon hydride.

引用

页码：698 / 701

共 50 条

[1] Electron microscopy of interfaces in chemical vapour deposition diamond films on silicon
Wittorf, D
Jäger, W
Dieker, C
Flöter, A
Güttler, H
DIAMOND AND RELATED MATERIALS, 2000, 9 (9-10) : 1696 - 1702
[2] CHEMICAL VAPOUR DEPOSITION OF SILICON DIOXIDE FILMS
KESAVAN, R
RATNAVATI, V
INDIAN JOURNAL OF TECHNOLOGY, 1969, 7 (09): : 282 - +
[3] Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates
Schelz, S
Borges, CFM
Martinu, L
Moisan, M
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (05): : 2743 - 2749
[4] Plasma enhanced chemical vapour deposition of diamond films
Gicquel, A.
Anger, E.
Fabre, D.
Vide, les Couches Minces, 1992, (261):
[5] Deposition of heteroepitaxial diamond films on 2 in silicon substrates
Jiang, X
Paul, M
Klages, CP
DIAMOND AND RELATED MATERIALS, 1996, 5 (3-5) : 251 - 255
[6] Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations
Reshi, Bilal Ahmad
Kartha, Moses J.
Misra, Anuradha
Varma, Raghava
MATERIALS RESEARCH EXPRESS, 2019, 6 (09)
[7] Diamond chemical vapour deposition on seeded cemented tungsten carbide substrates
Cabral, Gil
Madaleno, J. C.
Titus, E.
Ali, N.
Gracio, J.
THIN SOLID FILMS, 2006, 515 (01) : 158 - 163
[8] Chemical vapour deposition of diamond
Marinkovic, SN
ADVANCED MATERIALS FOR HIGH TECHNOLOGY APPLICATIONS, 1996, 214 : 171 - 178
[9] Diamond chemical vapour deposition
Ashfold, MNR
May, PW
CHEMISTRY & INDUSTRY, 1997, (13) : 505 - 508
[10] Multivariable study on growth of diamond on diamond substrates by microwave plasma chemical vapour deposition
Reshi, Bilal Ahmad
Kumar, Shyam
Misra, Anuradha
Varma, Raghava
MATERIALS RESEARCH EXPRESS, 2019, 6 (04):

← 1 2 3 4 5 →