Reactive ion etching of tungsten in SF6-N2 plasma

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[1] Mutsukura, Nobuki
[2] Turban, Guy
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Mutsukura, Nobuki | 1600年 / 137期
关键词：
Mass Spectrometry - Reactive Ion Etching - Sulfur Hexafluoride Gas - X-ray Photoelectron Spectroscopy;
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