Investigation of the substrate/epitaxial interface of Si/Si1-xGex layers grown by LPCVD

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作者：
Loo, R.
Vescan, L.
Dieker, C.
Freundt, D.
Hartmann, A.
Muck, A.
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Journal De Physique | 1995年 / 5卷 / 06期
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页码：5 / 895
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