Stainless-steel-AlN cermet selective surfaces deposited by direct current magnetron sputtering technology

被引：0
|
作者：
Univ of Sydney, Sydney [1 ]
机构：
来源：
Sol Energ Mater Sol Cells | / 1-2卷 / 95-106期
关键词：
Number:; -; Acronym:; Usyd; Sponsor: University of Sydney;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] CHARACTERIZATION OF TUNGSTEN-CARBON LAYERS DEPOSITED ON STAINLESS-STEEL BY REACTIVE MAGNETRON SPUTTERING
    PAULEAU, Y
    GOUYPAILLER, P
    JOURNAL OF MATERIALS RESEARCH, 1992, 7 (08) : 2070 - 2079
  • [22] Structural and quantitative analysis of nitrided stainless steel coatings deposited by dc-magnetron sputtering
    Terwagne, G
    Colaux, J
    Collins, GA
    Bodart, F
    THIN SOLID FILMS, 2000, 377 (377-378) : 441 - 446
  • [23] Mechanical and tribological properties of crystalline aluminum nitride coatings deposited on stainless steel by magnetron sputtering
    Choudhary, R. K.
    Mishra, S. C.
    Mishra, P.
    Limaye, P. K.
    Singh, K.
    JOURNAL OF NUCLEAR MATERIALS, 2015, 466 : 69 - 79
  • [24] Temperature effect of nitrided stainless steel coatings deposited by reactive DC-magnetron sputtering
    Terwagne, G
    Colaux, J
    Mitchell, DR
    Short, KT
    THIN SOLID FILMS, 2004, 469 : 167 - 172
  • [25] Stainless steel films deposited by de unbalanced magnetron sputtering using SUS304 steel target
    Inoue, S
    Saeki, T
    Koterazawa, K
    Uchida, H
    Iwasa, M
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2000, 64 (12) : 1218 - 1223
  • [26] Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering
    Shah, Hetal N.
    Jayaganthan, R.
    Kaur, Davinder
    Chandra, Ramesh
    THIN SOLID FILMS, 2010, 518 (20) : 5762 - 5768
  • [27] Oxidation behavior of copper nitride thin films deposited by direct current magnetron sputtering
    Devaraj, Perumal
    Peranantham, Pazhanisami
    Jeyachandran, Yekkoni Lakshmanan
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2021, 32 (23) : 27899 - 27912
  • [28] Microstructure and Properties of CrAlSiN Coatings Deposited by HiPIMS and Direct-Current Magnetron Sputtering
    Fan, Qixiang
    Liang, Yangmengtian
    Wu, Zhenghuan
    Liu, Yanmei
    Wang, Tiegang
    COATINGS, 2019, 9 (08)
  • [29] Properties of Ti and Ti-alloy film deposited by direct current magnetron sputtering
    Institute of Metal Research, Chinese Acad. of Sci., Shenyang 110016, China
    Yuanzineng Kexue Jishu, 2008, 10 (933-937):
  • [30] Oxidation behavior of copper nitride thin films deposited by direct current magnetron sputtering
    Perumal Devaraj
    Pazhanisami Peranantham
    Yekkoni Lakshmanan Jeyachandran
    Journal of Materials Science: Materials in Electronics, 2021, 32 : 27899 - 27912
12345