Plasma etching and plasma physics experiments for the undergraduate microelectronics course

被引：0
|
作者：
Univ of New Mexico, Albuquerque, United States [1 ]
机构：
来源：
IEEE Trans Educ | / 3卷 / [d]207-212期
基金：
美国国家科学基金会;
关键词：
Education - Engineering education - Integrated circuit manufacture - Semiconductor device manufacture - Teaching;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Plasma Etching of Silk Fibroin: Experiments and Models
    Narayanamoorthy, Jayasri
    Tsioris, Konstantinos
    Omenetto, Fiorenzo G.
    Hopwood, Jeffrey
    PLASMA PROCESSES AND POLYMERS, 2013, 10 (05) : 451 - 458
  • [22] PLASMA IMMERSION ION-IMPLANTATION DOPING EXPERIMENTS FOR MICROELECTRONICS
    QIN, S
    CHAN, C
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02): : 962 - 968
  • [23] Laboratory plasma physics experiments using merging supersonic plasma jets
    Hsu, S. C.
    Moser, A. L.
    Merritt, E. C.
    Adams, C. S.
    Dunn, J. P.
    Brockington, S.
    Case, A.
    Gilmore, M.
    Lynn, A. G.
    Messer, S. J.
    Witherspoon, F. D.
    JOURNAL OF PLASMA PHYSICS, 2015, 81
  • [24] Plasma etching and patterning of CVD diamond at <100 degrees C for microelectronics applications
    Ramesham, R
    Welch, W
    Neely, WC
    Rose, MF
    Askew, RF
    THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 665 - 670
  • [25] Training software apparatus for a plasma physics course
    Chirtsov, Alexander
    Sychov, Sergey
    Vladimir, Mikushev
    PROCEEDINGS OF THE 2018 SECOND WORLD CONFERENCE ON SMART TRENDS IN SYSTEMS, SECURITY AND SUSTAINABILITY (WORLDS4), 2018, : 72 - 77
  • [26] Plasma etching and patterning of CVD diamond at <100 degrees C for microelectronics applications
    Ramesham, R
    Welch, W
    Neely, WC
    Rose, MF
    Askew, RF
    THIN SOLID FILMS, 1997, 304 (1-2) : 245 - 251
  • [27] A PLASMA SOURCE FOR MIRROR PHYSICS SIMULATION EXPERIMENTS
    VANDEGRIFT, G
    DONAHUE, K
    VELAT, D
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1991, 62 (04): : 906 - 908
  • [28] PLASMA PHYSICS EXPERIMENTS ON A SCALE OF MICRONS AND PICOSECONDS
    ATTWOOD, D
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (05): : 690 - 690
  • [29] Online and FREE access to plasma physics experiments
    Rossa, Pedro A. Mendes A.
    Kuriscak, Pavel
    Silva, Joao N.
    Veiga, Jose
    Loureiro, Joao P. S.
    Oliveira, Joao
    Hachmeister, Daniel
    Fernandes, Horacio
    NUKLEONIKA, 2023, 68 (01) : 37 - 46
  • [30] Hydrogen etching for semiconductor materials in plasma doping experiments
    Qin, S
    Bernstein, JD
    Chan, C
    JOURNAL OF ELECTRONIC MATERIALS, 1996, 25 (03) : 507 - 511
12345