Properties of Ge doped a-SixCy:H films prepared by co-sputtering

被引:0
|
作者
Takamatsu Natl Coll of Technology, Takamatsu, Japan [1 ]
机构
来源
Shinku | / 3卷 / 171-174期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] SUPERCONDUCTING PROPERTIES OF NB3GE THIN-FILMS PREPARED BY CO-SPUTTERING
    BRAUN, HF
    SAUR, EJ
    JOURNAL OF LOW TEMPERATURE PHYSICS, 1978, 33 (1-2) : 87 - 107
  • [2] Fesixoy films prepared by co-sputtering
    Ehara, T
    Saito, M
    Naito, S
    Kokubun, Y
    OPTOELECTRONIC MATERIALS AND TECHNOLOGY IN THE INFORMATION AGE, 2002, 126 : 67 - 78
  • [3] Effects of Tl impurities on the properties of amorphous SiC:H films prepared by co-sputtering
    Saito, N.
    Inui, Y.
    Yamaguchi, T.
    Nakaaki, I.
    Thin Solid Films, 1996, 281-282 (1-2) : 302 - 304
  • [4] The effects of Tl impurities on the properties of amorphous SiC:H films prepared by co-sputtering
    Saito, N
    Inui, Y
    Yamaguchi, T
    Nakaaki, I
    THIN SOLID FILMS, 1996, 281 : 302 - 304
  • [5] Thermoelectric properties of Nb-doped SrTiO3 films prepared by co-sputtering
    Kim, Jinseo
    Le Thai Duy
    Lee, Sang Yeon
    Ko, Minhwan
    Seo, Hyungtak
    JOURNAL OF ASIAN CERAMIC SOCIETIES, 2020, 8 (04) : 1135 - 1146
  • [6] Optical and electrical properties of nonstoichiometric a-Ge1-xCx films prepared by magnetron co-sputtering
    Zhu, J. Q.
    Jiang, C. Z.
    Han, J. C.
    Yu, H. L.
    Wang, J. Z.
    Jia, Z. C.
    Chen, R. R.
    APPLIED SURFACE SCIENCE, 2012, 258 (08) : 3877 - 3881
  • [7] Properties of amorphous ternary alloy films a-SixCyGez:H prepared by magnetron co-sputtering
    Saito, N
    Nakaaki, I
    Nakamura, S
    Yoshioka, S
    Yamaguchi, T
    APPLIED SURFACE SCIENCE, 2001, 169 : 472 - 475
  • [8] Magnetic Properties of FeCo Films Prepared by Co-Sputtering and Hydrogenous Gas Reactive Sputtering
    Liu, Xiaoxi
    Morisako, Akimitsu
    IEEE TRANSACTIONS ON MAGNETICS, 2008, 44 (11) : 3910 - 3912
  • [9] Microstructure, magnetic and nanomechanical properties of FeTaN films prepared by co-sputtering
    Mackay, K
    Papakonstantinou, P
    Dodd, PM
    Atkinson, R
    Pollard, RJ
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (01) : 41 - 47
  • [10] Properties of transparent conductive ZnO:Al films prepared by co-sputtering
    Oh, BY
    Jeong, MC
    Lee, W
    Myoung, JM
    JOURNAL OF CRYSTAL GROWTH, 2005, 274 (3-4) : 453 - 457