Low temperature growth of amorphous and polycrystalline silicon films from a modified inductively coupled plasma

被引：0
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作者：
Goto, Masashi [1 ]
Toyoda, Hirotaka [1 ]
Kitagawa, Masatoshi [1 ]
Hirao, Takashi [1 ]
Sugai, Hideo [1 ]
机构：
[1] Nagoya Univ, Nagoya, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 6 A期
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页码：3714 / 3720
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