Soft magnetic properties of Fe-Si-N thin films

被引：0
|
作者：
Yano, N.
Ohnuma, S.
Hayashide, M.
Matsumoto, F.
Fujimori, H.
Masumoto, T.
机构：
[1] Amorphous Magnetic Device Laboratory, Japan
[2] Tohoku University, Japan
来源：
IEEE translation journal on magnetics in Japan | 1992年 / 7卷 / 04期
关键词：
531 Metallurgy and Metallography - 539 Metals Corrosion and Protection; Metal Plating - 545 Iron and Steel - 701 Electricity and Magnetism;
D O I：
10.1109/TJMJ.1992.4565382
中图分类号：
学科分类号：
摘要：
7
引用
收藏
页码：295 / 300
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