Surface chemistry on semiconductors by molecular-beam reactive scattering

This Report reviews the use of molecular-beam reactive scattering to study the surface reactions of gas molecules on semiconductors which have relevance to microelectronic technologies. Modern semiconductor fabrication techniques rely heavily on dry processes where gas-surface reactions are the basic premise. This article focuses on the use of supersonic molecular-beam-surface scattering to study the dynamics and kinetics of surface reactions connected with the growth and etching processes on semiconductor surfaces. The discussion on growth processes covers the oxidation of silicon and germanium, the tungsten-hexafluoride-based tungsten deposition, and the organometallic chemical vapor deposition of gallium arsenide. The discussion on etching processes covers the halogen-based etching of gallium arsenide and silicon. An overview of the experimental technique and the underlying principles in surface-reaction dynamics and kinetics is included for readers in the technology area. The potential use of the molecular beams for actual semiconductor materials processing is also discussed.