X-ray masks

被引：0

作者：

Ohki, Shigehisa ^{[1
]}

Ozawa, Akira ^{[1
]}

Ohkubo, Takashi ^{[1
]}

Okada, Ikuo ^{[1
]}

机构：

[1] NTT LSI Lab

来源：

NTT R and D | 1994年 / 43卷 / 06期

关键词：

Antivibration mountings - Argon - Chlorine - Cyclotron resonance - Etching - Mixtures - Oxygen - Tantalum - X ray lithography;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

X-ray mask pattern accuracy was improved by a new method that superimposes multiple exposures using different field sizes. Significant errors induced by frame mounting were completely suppressed by a new one-point mounting method. Highly accurate Ta absorber patterns were obtained by ECR dry etching using a gaseous mixture of Cl2, O2, and Ar. X-ray masks with pattern placement accuracies as high as 0.056 μm (3σ) were successfully fabricated.

引用

页码：617 / 624

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