Use of attenuated phase masks in extreme ultraviolet lithography

被引：0
|
作者：
Wood, O.R. II
White, D.L.
Bjorkholm, J.E.
Fetter, L.E.
Tennant, D.M.
MacDowell, A.A.
LaFontaine, B.
Kubiak, G.D.
机构：
来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Status of fabrication of square format masks for extreme ultraviolet lithography (EUVL) at the MCoC
    Racette, K
    Williams, C
    Fisch, E
    Kindt, L
    Lawliss, M
    Ackel, R
    Lercel, M
    EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 161 - 172
  • [42] Evaluation of finished extreme ultraviolet lithography (EUVL) masks using a EUV microscope
    Haga, T
    Kinoshita, H
    Hamamoto, K
    Takada, S
    Kazui, N
    Kakunai, S
    Tsubakino, H
    Watanabe, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 3771 - 3775
  • [43] Approach to patterning of extreme ultraviolet lithography masks using Ru buffer layer
    Lee, BT
    Hoshino, E
    Takahashi, M
    Yoneda, T
    Yamanashi, H
    Hoko, H
    Ryoo, MH
    Chiba, A
    Ito, M
    Sugawara, M
    Ogawa, T
    Okazaki, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (12): : 6998 - 7001
  • [44] Design and method of fabricating phase shift masks for extreme ultraviolet lithography by partial etching into the EUV multilayer mirror
    Han, SI
    Weisbrod, E
    Xie, QH
    Mangat, PJS
    Hector, SD
    Dauksher, WJ
    EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 314 - 330
  • [45] Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry
    Perlich, J
    Kamm, FM
    Rau, J
    Scholze, F
    Ulm, G
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3059 - 3062
  • [46] Extreme ultraviolet lithography
    Wallen, Hayley
    NATURE REVIEWS METHODS PRIMERS, 2024, 4 (01):
  • [47] Extreme ultraviolet lithography
    Stulen, RH
    Sweeney, DW
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1999, 35 (05) : 694 - 699
  • [48] EXTREME ULTRAVIOLET LITHOGRAPHY
    Cummings, Kevin
    Suzuki, Kazuaki
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 8 (04):
  • [49] Extreme ultraviolet lithography
    Gwyn, CW
    Stulen, R
    Sweeney, D
    Attwood, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3142 - 3149
  • [50] Extreme ultraviolet lithography
    Sandia Natl Lab, Livermore, United States
    Opt Photonics News, 8 (35-38):
12345