Use of attenuated phase masks in extreme ultraviolet lithography

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作者：
Wood, O.R. II
White, D.L.
Bjorkholm, J.E.
Fetter, L.E.
Tennant, D.M.
MacDowell, A.A.
LaFontaine, B.
Kubiak, G.D.
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
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