Simulative calculation of the dose enhancement factor of W-SiO2 and Ta-SiO2 interface

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作者：
Mu, W.B. [1 ]
Chen, P.X. [1 ]
机构：
[1] Inst. of Nuclear Phys. and Chem., Chinese Acad. of Eng. Phys., P.O. Box 919-213, Mianyang 621900, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2001年 / 13卷 / 01期
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摘要：
4
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页码：15 / 18
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