CRITICAL COMPARISON OF SILICIDE FILM DEPOSITION TECHNIQUES.

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作者：
Ahn, K.Y. [1 ]
Basavaiah, S. [1 ]
机构：
[1] IBM, Thomas J. Watson Research Cent,, Yorktown Heights, NY, USA, IBM, Thomas J. Watson Research Cent, Yorktown Heights, NY, USA
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| 1600年 / 118期
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TUNGSTEN COMPOUNDS
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