共 50 条
- [1] PHOSPHORUS DIFFUSION INTO SILICON FROM A SPIN-ON SOURCE USING RAPID THERMAL-PROCESSINGJOURNAL OF APPLIED PHYSICS, 1992, 71 (11) : 5474 - 5478HARTITI, BSLAOUI, AMULLER, JCSTUCK, RSIFFERT, P
- [2] Boron diffusion from a spin-on source during rapid thermal processingJOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 254 : 89 - 93Nolan, MPerova, TMoore, RAGamble, HS
- [3] DIFFUSION OF PHOSPHORUS IN SILICON DIOXIDE FROM A SPIN-ON SOURCETHIN SOLID FILMS, 1980, 65 (03) : 373 - 380KUISL, MSASSE, E
- [5] Phosphorus diffusion from a spin-on doped glass (SOD) source during rapid thermal annealingRAPID THERMAL PROCESSING, 1999, 84 : 231 - 236Mathiot, DLachiq, ASlaoui, ANoël, SMuller, JCDubois, C
- [6] SILICON DOPING FROM PHOSPHORUS SPIN-ON DOPANT SOURCES IN PROXIMITY RAPID THERMAL-DIFFUSIONJOURNAL OF APPLIED PHYSICS, 1994, 75 (01) : 337 - 344ZAGOZDZONWOSIK, WGRABIEC, PBLUX, G
- [7] DIFFUSION IN SILICON FROM A SPIN-ON HEAVILY PHOSPHORUS-DOPED OXIDE SOURCEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (10) : 2299 - 2302FLOWERS, DLWU, SY
- [8] SHALLOW-JUNCTION FORMATION ON SILICON BY RAPID THERMAL-DIFFUSION OF IMPURITIES FROM A SPIN-ON SOURCEIEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (01) : 105 - 110USAMI, AANDO, MTSUNEKANE, MWADA, T
- [9] KINETICS OF PHOSPHORUS PROXIMITY RAPID THERMAL-DIFFUSION USING SPIN-ON DOPANT SOURCE FOR SHALLOW JUNCTIONS FABRICATIONJOURNAL OF APPLIED PHYSICS, 1995, 78 (01) : 204 - 211GRABIEC, PBZAGOZDZONWOSIK, WLUX, G
- [10] SOURCE DRAIN FORMATION USING SPIN-ON DOPANTS AND SUBSEQUENT RAPID THERMAL-DIFFUSIONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C377 - C377SHEETS, GWKOZICKI, MN
