Strain determination in silicon microstructures by combined convergent beam electron diffraction, process simulation, and micro-Raman spectroscopy

被引：0
|
作者：
Senez, Vincent [1 ,7 ]
Armigliato, Aldo [2 ]
De Wolf, Ingrid [3 ]
Carnevale, Gianpietro [4 ]
Balboni, Roberte [2 ]
Frabboni, Stefano [5 ]
Benedett, Alessandro [3 ,6 ]
机构：
[1] IEMN-ISEN, UMR CNRS-8520, Avenue Poincaré, 59652 Villeneuve d'Ascq Cédex, France
[2] CNR-IMM, Sezione di Bologna, Via P. Gobetti 101, 40129 Bologna, Italy
[3] IMECvzw, Kalpeldreef 75, 3001 Leuven, Belgium
[4] STMicroelectronics, via C. Olivetti 2, 20041 Agrate Brianza, Italy
[5] INFM, National Research Centre-S3, Univ. di Modern e Reggio Emilia, via G. Campi 213/A, 41100 Modena, Italy
[6] Department of Electronic Engineering, University of Sheffield, Mappin Street, S13JD Sheffield, United Kingdom
[7] LIMMS/CNRS-IIS, Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
来源：
Journal of Applied Physics | 2003年 / 94卷 / 09期
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摘要：
(Edited Abstract)
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页码：5574 / 5583
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