Electronic properties of cesium-covered GaN(0001) surfaces

被引:0
|
作者
Kampen, Thorsten U. [1 ]
Eyckeler, M. [1 ]
Moench, W. [1 ]
机构
[1] Gerhard-Mercator-Universitaet, Duisburg, Duisburg, Germany
来源
Applied Surface Science | 1998年 / 123-124卷
关键词
Cesium - Deposition - Electronic properties - Film growth - Ionization of solids - Semiconducting gallium compounds - Surface properties - X ray photoelectron spectroscopy;
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摘要
Cesium was deposited on clean n-GaN(0001)-1×1 surfaces at 150 K using Cs dispensers, X-ray photoemission spectroscopy showed that the Cs-films grow layer by layer. Cesium-induced variations of electronic surface properties were observed using photoemission spectroscopy with monochromatized He I radiation (UPS) and a Kelvin probe (CPD). The UPS data recorded with clean GaN(0001) surfaces give their ionization energy as 6.8±0.1 eV, so that their electron affinity measures 3.35±0.1 eV. The work function of clean GaN(0001) surfaces was determined as 4±0.2 eV. Cesium deposition first reduces the work function by up to 2.7 eV and then increases it until eventually a work function of 2 eV is reached. A simple point-charge model easily explains this decrease of the work function by the formation of surface dipoles. The latter value is characteristic of bulk cesium.
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页码:28 / 32
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