Determination of the Contact Potential Difference PHI MS Metal-Semiconductor by the Method of Analysis of the C-V Characteristics of a MIS Capacitor.

被引：0
|
作者：
Jakubowski, Andrzej
机构：
来源：
Elektronika Warszawa | 1980年 / 21卷 / 10期
关键词：
CAPACITORS; -; Analysis;
D O I：
暂无
中图分类号：
TN [电子技术、通信技术];
学科分类号：
0809 ;
摘要：
The method of determining metal-semiconductor work function difference PHI //M//S based on the analysis of high-frequency MIS capacitor C-V characteristics has been described. The procedure to follow as well as sources of errors made when applying the method have been discussed.
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页码：15 / 18
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