Plasma enhanced chemical vapour deposition of diamond films

被引：0
|
作者：
Gicquel, A.
Anger, E.
Fabre, D.
机构：
来源：
Vide, les Couches Minces | 1992年 / 261期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Preparation of cobalt oxide films by plasma-enhanced metalorganic chemical vapour deposition
    Fujii, E
    Torii, H
    Tomozawa, A
    Takayama, R
    Hirao, T
    JOURNAL OF MATERIALS SCIENCE, 1995, 30 (23) : 6013 - 6018
  • [32] UV moderation of nitride films during remote plasma enhanced chemical vapour deposition
    Butcher, KSA
    Chen, APPT
    Goldys, EM
    Tansley, TL
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 2001, 188 (02): : 667 - 671
  • [33] Plasma-enhanced chemical vapour deposition and structural characterization of amorphous chalcogenide films
    Nagels, P
    Callaerts, R
    Mertens, R
    JOURNAL DE PHYSIQUE IV, 1999, 9 (P8): : 717 - 724
  • [34] Hydrophility of TiO2 films prepared by plasma enhanced chemical vapour deposition
    Horakova, M.
    Kolouch, A.
    Spatenka, P.
    Spatenka, P.
    CZECHOSLOVAK JOURNAL OF PHYSICS, 2006, 56 : B1185 - B1191
  • [35] Characterization of thin films deposited with precursor ferrocene by plasma enhanced chemical vapour deposition
    Yao, Kailun
    Zheng, Jianwan
    Liu, Zuli
    Jia, Lihui
    PLASMA SCIENCE & TECHNOLOGY, 2007, 9 (04) : 436 - 439
  • [36] Properties of amorphous SiC thin films prepared by plasma enhanced chemical vapour deposition
    Huran, J
    Kobzev, AP
    Safrankova, J
    Hotovy, I
    SEMICONDUCTING AND INSULATING MATERIALS, 1996: PROCEEDINGS OF THE 9TH CONFERENCE ON SEMICONDUCTING AND INSULATING MATERIALS (SIMC'96), 1996, : 249 - 252
  • [37] Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition
    Iliescu, Ciprian
    Chen, Bangtao
    Wei, Jiashen
    Pang, Ah Ju
    THIN SOLID FILMS, 2008, 516 (16) : 5189 - 5193
  • [38] Plasma-enhanced chemical vapour deposition and structural characterization of amorphous chalcogenide films
    Nagels, P.
    Callaerts, R.
    Mertens, R.
    Journal De Physique. IV : JP, 1999, 9 pt 2 (08): : 8 - 717
  • [39] Deposition of functional coatings on polyethylene terephthalate films by magnetron-plasma-enhanced chemical vapour deposition
    Fahland, M.
    Vogt, T.
    Meyer, B.
    Fahlteich, J.
    Schiller, N.
    Vinnichenko, M.
    Munnik, F.
    THIN SOLID FILMS, 2009, 517 (10) : 3043 - 3047
  • [40] Deposition of aluminium nitride films by electron cyclotron resonance plasma-enhanced chemical vapour deposition
    Ecke, G
    Eichhorn, G
    Pezoldt, J
    Reinhold, C
    Stauden, T
    Supplieth, F
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1503 - 1509
12345