EFFECT OF ULTRAVIOLET IRRADIATION ON ELECTROLESS PLATING PROCESS OF NICKEL.

被引：0
|
作者：
Nakamichi, Ichiro [1 ]
Ishikawa, Yutaka [1 ]
Hirose, Yoichi [1 ]
机构：
[1] Nippon Inst of Technology, Minamisaitama, Jpn, Nippon Inst of Technology, Minamisaitama, Jpn
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1987年 / 26卷 / 04期
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学科分类号：
摘要：
9
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页码：228 / 230
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