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- [4] The formation of silicon dioxide films by TEOS photochemical decomposition Mikroelektronika, 2001, 30 (01): : 27 - 32
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- [9] Characterization of low-temperature PECVD silicon dioxide films PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS, 1999, 555 : 197 - 202
- [10] Silicon films produced by PECVD under powder formation conditions PLASMA PROCESSING AND DUSTY PARTICLES, 2000, 382 : 21 - 28