Concept of a Deflection-Focusing System in Electron Optics.

被引:0
|
作者
De Chambost, E.
机构
来源
| 1978年 / 10卷 / 04期
关键词
ELECTRON BEAMS - Focusing;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In electron beam microlithography, a magnetic lens and deflection system should allow the beam to be scanned over as wide a field as possible with minimum aberration. A study was carried out to optimize the principal parameters of the system.
引用
收藏
页码:757 / 774
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