Alternative chemistries for chamber cleans to reduce perfluorocompound (PFC) emissions

被引：0
|
作者：
Department of Chemical Engineering, University of Texas, Austin, TX, United States [1 ]
不详 [2 ]
不详 [3 ]
不详 [4 ]
不详 [5 ]
不详 [6 ]
机构：
来源：
SSA Journal: Journal of the Semiconductor Safety Association | 2000年 / 14卷 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
14
引用
收藏
页码：17 / 25
相关论文
共 44 条
  • [1] Facing the challenges of reducing PFC emissions in plasma chamber cleans
    Sweeney, JA
    Sweeney, JD
    MICRO, 1998, 16 (07): : 87 - +
  • [2] PFC emissions reduction and process improvements with remote plasma CVD chamber cleans
    Mendicino, L
    Brown, PT
    Filipiak, S
    Nauert, C
    Estep, H
    Fletcher, M
    ENVIRONMENTAL ISSUES WITH MATERIALS AND PROCESSES FOR THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES V, 2002, 2002 (15): : 144 - 156
  • [3] Remote microwave technology for chamber clean to reduce PFC emissions
    Mendicino, L
    Filipiak, S
    Brown, PT
    Langan, J
    Ridgeway, R
    Johnson, A
    Pearce, R
    Maroulis, P
    Atherton, A
    TWENTY THIRD IEEE/CPMT INTERNATIONAL ELECTRONICS MANUFACTURING TECHNOLOGY SYMPOSIUM, 1998, : 267 - 276
  • [4] DILUTE CHEMISTRIES OFFER EFFECTIVE ALTERNATIVE TO CLASSIC RCA CLEANS
    不详
    MICROCONTAMINATION, 1994, 12 (08): : 43 - 43
  • [5] Remote plasma clean technology for dielectric CVD chamber cleaning to reduce PFC emissions
    Mendicino, L
    Brown, PT
    Filipiak, S
    Loop, D
    Basnett, R
    Holber, W
    Pearce, R
    Johnson, A
    ENVIRONMENTAL ISSUES IN THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES, 1999, 99 (08): : 40 - 51
  • [6] Global semiconductor industry initiative to reduce PFC emissions
    Rand, SD
    Bartos, SC
    Fraust, CL
    Hayakawa, Y
    Klerks, L
    NON-C02 GREENHOUSE GASES: SCIENTIFIC UNDERSTANDING, CONTROL OPTIONS AND POLICY ASPECTS, 2002, : 409 - 414
  • [7] Reducing PFC gas emissions from CVD chamber cleaning
    Johnson, AD
    Entley, WR
    Maroulis, PJ
    SOLID STATE TECHNOLOGY, 2000, 43 (12) : 103 - +
  • [8] Reduction of PFC emissions through process advances in CVD chamber cleaning
    Hsu, S
    Allgood, CC
    Mocella, MT
    ENVIRONMENTAL ISSUES WITH MATERIALS AND PROCESSES FOR THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES V, 2002, 2002 (15): : 139 - 143
  • [9] Low Voltage PFC Measurements and Potential Alternative to Reduce Them at Alcoa Smelters
    Batista, Eliezer
    Espinoza-Nava, Luis
    Tulga, Christopher
    Marcotte, Richard
    Duchemin, Yan
    Manolescu, Petre
    LIGHT METALS 2018, 2018, : 1463 - 1467
  • [10] Effect of different chamber geometries on combustion formation to reduce harmful emissions
    Doppalapudi, Arun Teja
    Azad, Abul Kalam
    Khan, Mohammad Masud Kamal
    Oo, Aman Maung Than
    APPLIED THERMAL ENGINEERING, 2025, 261
12345