Structural homogeneity of boron carbide thin films fabricated using plasma-enhanced chemical vapor deposition from B5H9 + CH4

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Lee, Sunwoo
Mazurowski, J.
O'Brien, W.L.
Dong, Q.Y.
Jia, J.J.
Cailcott, T.A.
Tan, Yexin
Miyano, K.E.
Ederer, D.L.
Mueller, D.R.
Dowben, P.A.
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Journal of Applied Physics | 1993年 / 74卷 / 11期
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