Plasma production by m = 0 standing helicon waves

被引：0
|
作者：
Nisoa, Mudtorlep [1 ]
Sakawa, Youichi [1 ]
Shoji, Tatsuo [1 ]
机构：
[1] Nagoya Univ, Nagoya, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2000年 / 39卷 / 5 A期
关键词：
D O I：
10.1143/jjap.39.l429
中图分类号：
学科分类号：
摘要：
Plasma sources
引用
收藏
相关论文
共 50 条
  • [31] SiO2 etching using M = 0 helicon wave plasma
    Nogami, Hiroshi
    Nakagawa, Yukito
    Mashimo, Kimiko
    Ogahara, Yoneichi
    Tsukada, Tsutomu
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2477 - 2482
  • [32] SiO2 etching using M=0 helicon wave plasma
    Nogami, H
    Nakagawa, Y
    Mashimo, K
    Ogahara, Y
    Tsukada, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (4B): : 2477 - 2482
  • [33] HELICON WAVES IN A SEMICONDUCTOR PLASMA - REPLY
    FREIRE, GF
    PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (07): : 1123 - &
  • [34] Rf power absorption and antenna impedance in an m=0 helicon plasma source
    Shamrai, KP
    Pavlenko, VP
    PHYSICA SCRIPTA, 1997, 55 (05): : 612 - 616
  • [35] Peculiarities of the helicon mode propagation with m < 0 in radially nonuniform plasma cylinder
    Yu. M. Aliev
    Bulletin of the Lebedev Physics Institute, 2008, 35 : 211 - 213
  • [36] HELICON WAVES IN CYLINDRICAL PLASMA COLUMNS
    SHOUCRI, MM
    PLASMA PHYSICS, 1969, 11 (12): : 1017 - &
  • [37] Peculiarities of the Helicon Mode Propagation with m &lt; 0 in Radially Nonuniform Plasma Cylinder
    Aliev, Yu. M.
    BULLETIN OF THE LEBEDEV PHYSICS INSTITUTE, 2008, 35 (07) : 211 - 213
  • [38] HELICON WAVES IN A NON-UNIFORM PLASMA
    BLEVIN, HA
    CHRISTIANSEN, PJ
    PLASMA PHYSICS, 1968, 10 (08): : 799 - +
  • [39] HELICON WAVES IN A CYLINDRICAL PLASMA-COLUMN
    SHOUCRI, M
    JOURNAL OF PLASMA PHYSICS, 1994, 52 : 465 - 470
  • [40] Helicon waves in a non-uniform plasma
    Chen, Francis F.
    Hsieh, M. Johannes
    Light, Max
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (01): : 49 - 57
12345