Fabrication of diamond membranes for MEMS using reactive ion etching of silicon

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California Inst of Technology, Pasadena, United States [1 ]
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Thin Solid Films | / 2卷 / 62-66期
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This research work was carried out at the Jet Propulsion Laboratory; California Institute of Technology and was supported by the NASA Code Q for the Office of Safety and Mission Assurance Program 323-79. Thanks are due to Mr. Robert Candler; Mr. Jason Parish; and Ms. Cari Flohr (undergraduate students) of the Electrical Engineering Department of Auburn University for their help in the microelectronics laboratory;
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