BORON DOPING TO MICROCRYSTALLINE SiNx:H FILMS.

被引：0
|
作者：
Hasegawa, Seiichi [1 ]
Segawa, Mizuki [1 ]
Kurata, Yoshihiro [1 ]
机构：
[1] Kanazawa Univ, Kanazawa, Jpn, Kanazawa Univ, Kanazawa, Jpn
来源：
| 1600年 / 25期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
SEMICONDUCTING SILICON
引用
收藏
相关论文
共 50 条
  • [31] THIN BORON-DOPED MICROCRYSTALLINE SILICON FILMS
    SHEN, DS
    BHAT, PK
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1993, 30 (02) : 139 - 145
  • [32] Purification of Boron in Bulk Form or As Thin Films. Physical Characterization of Boron.
    Thevenot, F.
    Viala, J.C.
    Vide, 1979, 34 (195): : 35 - 45
  • [33] INFLUENCE OF BORON DOPING ON THE TRANSPORT-PROPERTIES OF A-SI-H FILMS
    BEYER, W
    MELL, H
    SOLID STATE COMMUNICATIONS, 1981, 38 (10) : 891 - 894
  • [34] THE DOPING EFFECT OF BORON ON GLOW-DISCHARGE A-SI-H FILMS
    WU, RL
    HE, YL
    SHEN, ZY
    KEXUE TONGBAO, 1984, 29 (09): : 1166 - 1169
  • [35] Evolution of the signature of nitrogen related defects in the X-ray absorption spectra of N-rich SiNx:H films.
    Paloura, EC
    Kanicki, J
    PROCEEDINGS OF THE FOURTH SYMPOSIUM ON THIN FILM TRANSISTOR TECHNOLOGIES, 1999, 98 (22): : 316 - 326
  • [36] ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films.
    Farsari, E.
    Kalampounias, A. G.
    Amanatides, E.
    Mataras, D.
    13TH HIGH-TECH PLASMA PROCESSES CONFERENCE (HTPP-2014), 2014, 550
  • [37] Effect of boron on the microstructure of hydrogenated microcrystalline silicon thin films
    Dussan, A.
    Koropecki, R. R.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4, NO 11, 2007, 4 (11): : 4134 - +
  • [38] Oxygen impurity doping into ultrapure hydrogenated microcrystalline Si films
    Kamei, T
    Wada, T
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (04) : 2087 - 2090
  • [39] Boron doping in a-SiO:H
    Kitani, Y.
    Maeda, T.
    Kakimoto, S.
    Tanaka, K.
    Okumoto, R.
    Sobajima, Y.
    Sada, C.
    Matsuda, A.
    Okamoto, H.
    CANADIAN JOURNAL OF PHYSICS, 2014, 92 (7-8) : 586 - 588
  • [40] Effect of boron dopant on the photoconductivity of microcrystalline hydrogenated silicon films
    A. G. Kazanskii
    H. Mell
    E. I. Terukov
    P. A. Forsh
    Semiconductors, 2002, 36 : 38 - 40
12345