Chemical mechanical polishing (CMP) in magnetic float polishing (MFP) of advanced ceramic (silicon nitride) and glass (silicon dioxide)

被引：0
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作者：
Jiang, M. [1 ]
Komanduri, R. [1 ]
机构：
[1] Mechanical and Aerospace Engineering, Oklahoma State University, Stillwater, OK 74078, United States
来源：
| 2001年 / Trans Tech Publications Ltd卷 / 202-203期
关键词：
High speed bearings - Magnetic float polishing (MFP);
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摘要：
(Edited Abstract)
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