INVESTIGATON OF THE STRENGTH OF THIN TUNGSTEN FILMS.

被引:0
|
作者
Garber, R.I.
Geysherik, V.S.
Mikhaylovskiy, I.M.
Fedorova, L.I.
机构
来源
| 1600年 / 42期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
The strength of thin monocrystalline tungsten foils is examined in programmes of stationary ( sigma equals 1500 kg/mm**2), single-pulse ( SIGMA greater than 1500 kg/mm**2) and pulsating ( sigma equals 0 minus 1. 2 multiplied by 10**3 kg/mm**2) loading with electric field in the chamber of a field-ion microscope. The dislocation structure of the thin foils was observed before and after rupture by transmission electron microscopy.
引用
收藏
相关论文
共 50 条
  • [1] XRD Analysis of Tungsten Thin Films.
    Djerdj, I.
    Tonejc, A. M.
    Tonejc, A.
    Radic, N.
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2004, 60 : S242 - S242
  • [2] Formation of Silicides in Thin Tungsten or Molybdenum Films.
    Oertel, Bernd
    Wissenschaftliche Zeitschrift - Technische Hochschule Ilmenau, 1979, 25 (06): : 151 - 156
  • [3] Tungsten imido complexes as precursors for mocvd of tungsten nitride thin films.
    McElwee-White, L
    Ortiz, CG
    Zhang, Y
    Johnston, SW
    Bchir, OJ
    Anderson, TJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U577 - U577
  • [4] Tungsten imido complexes as precursors for MoCvd of tungsten nitride thin films.
    McElwee-White, L
    Brooks, BC
    Ortiz, CG
    Johnston, SW
    Bchir, OJ
    Anderson, TJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2002, 224 : U682 - U682
  • [5] Chemical vapour deposition of tungsten oxide thin films.
    Parkin, IP
    Cross, WB
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U601 - U601
  • [6] ELECTRICAL TRANSPORT PROPERTIES OF TUNGSTEN SILICIDE THIN FILMS.
    Li, B.Z.
    Aitken, R.G.
    Applied Physics Letters, 1985, 46 (04) : 401 - 403
  • [7] TUNGSTEN DISILICIDE FORMATION IN CODEPOSITED AMORPHOUS WSix ALLOY THIN FILMS.
    Nava, F.
    Weiss, B.Z.
    Ahn, K.
    Tu, K.N.
    Vide, les Couches Minces, 1987, 42 (236): : 225 - 228
  • [8] Synthesis of single source precursors for the CVD of tungsten oxide thin films.
    Parkin, IP
    Cross, WB
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U599 - U599
  • [9] Properties of thin films.
    Hardy, WB
    NATURE, 1926, 118 : 700 - 701
  • [10] MULTICOMPONENT THIN FILMS.
    Kuznetsov, A.Ya.
    Kuleshov, A.P.
    Sakharova, K.V.
    1978, 45 (07): : 447 - 449