Plasma deposition of thin carbon/germanium alloy films from organogermanium compounds

被引：0
|
作者：
Gazicki, Maciej [1 ,2 ]
机构：
[1] Institut für Allgemeine Elektrotechnik und Elektronik, Technische Universität Wien, Gußhausstraße 27-29, A-1040 Vienna, Austria
[2] Institute of Materials Science and Engineering, Technical University of Lodź, Lodź 90-924, Poland
来源：
Chaos, solitons and fractals | 1999年 / 10卷 / 12期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1983 / 2017
相关论文
共 50 条
  • [21] The characterization of carbon nitride alloy thin films deposited by pulsed laser deposition
    Rusop, M
    Tian, XM
    Soga, T
    Jimbo, T
    Umeno, M
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2002, 386 : 89 - 96
  • [22] Growth and characterization of germanium carbon thin films deposited by VHF plasma CVD technique
    Yashiki, Yasutoshi
    Kouketsu, Seiichi
    Miyajima, Shinsuke
    Yamada, Akira
    Konagai, Makoto
    CONFERENCE RECORD OF THE 2006 IEEE 4TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION, VOLS 1 AND 2, 2006, : 1608 - +
  • [23] DEPOSITION OF SILICA FILMS ON GERMANIUM BY CARBON DIOXIDE PROCESS
    RAND, MJ
    ASHWORTH, JL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (01) : 48 - &
  • [24] Structure and Thermal Conductivity of Thin Films of the SiGe Alloy Formed by Electrochemical Deposition of Germanium into Porous Silicon
    Goroshko D.L.
    Gavrilin I.M.
    Dronov A.A.
    Goroshko O.A.
    Volkova L.S.
    Optoelectronics, Instrumentation and Data Processing, 2023, 59 (06) : 727 - 734
  • [25] SYNTHESIS BY LASER ABLATION AND CHARACTERIZATION OF PURE GERMANIUM-CARBON ALLOY THIN-FILMS
    YUAN, HJ
    WILLIAMS, RS
    CHEMISTRY OF MATERIALS, 1993, 5 (04) : 479 - 485
  • [26] Deposition and characterization of thin carbon films
    Olson, Aeli
    Berens, Matthew
    Heide, Alexander
    Winters, Brandon
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2017, 253
  • [27] RF-PLASMA DEPOSITION OF HYDROGENATED HARD CARBON THIN-FILMS
    BUBENZER, A
    DISCHLER, B
    BRANDT, G
    KOIDL, P
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 401 : 321 - 327
  • [28] Microwave plasma chemical vapour deposition of diamond like carbon thin films
    Patil, DS
    Ramachandran, K
    Venkatramani, N
    Pandey, M
    Venkateswaran, S
    D'Cunha, R
    JOURNAL OF ALLOYS AND COMPOUNDS, 1998, 278 (1-2) : 130 - 134
  • [29] INFLUENCE OF DEPOSITION PARAMETERS ON STRAIN SENSITIVITY OF THIN GERMANIUM FILMS
    PLASSA, M
    RUMIANO, G
    THIN SOLID FILMS, 1972, 12 (01) : 75 - &
  • [30] Influence of plasma power and substrate temperature on structure of nanocrystalline germanium carbon thin films by VHF plasma CVD
    Yashiki, Yasutoshi
    Kouketsu, Seiichi
    Miyajima, Shinsuke
    Yamada, Akira
    Konagai, Makoto
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (19-25) : 2355 - 2358
12345