共 50 条
- [1] Metallic contamination from wafer handling RECOMBINATION LIFETIME MEASUREMENTS IN SILICON, 1998, 1340 : 219 - 225
- [2] METALLIC CONTAMINATION FROM WAFER HANDLING JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (10): : 1517 - 1518
- [3] CONTAMINATION-FREE WAFER HANDLING AND IDENTIFICATION WESTERN ELECTRIC ENGINEER, 1976, 20 (02): : 42 - 49
- [5] Metallic contamination removal evaluation for single wafer processing ULTRA CLEAN PROCESSING OF SILICON SURFACES V, 2003, 92 : 49 - 52
- [6] Method of quantitative contamination with metallic impurities of the surface of a silicon wafer Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 (12): : 2361 - 2363
- [8] A METHOD OF QUANTITATIVE CONTAMINATION WITH METALLIC IMPURITIES OF THE SURFACE OF A SILICON-WAFER JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (12): : L2361 - L2363
- [10] Ionic contamination of the silicon wafer from wafer cleaning process CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING VII, PROCEEDINGS, 2002, 2002 (26): : 135 - 143