Dielectric breakdown and molecular orientation of poly(4,4′-oxydiphenylene pyromellitimide)

被引：0

作者：

Iida, Kazuo ^{[1
]}

Nakamura, Shuhei ^{[1
]}

Sawa, Goro ^{[1
]}

机构：

[1] Mie Univ, Tsu, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 11期

关键词：

Absorption spectroscopy - Coatings - Electric breakdown - Electric variables measurement - Molecular orientation - Polyimides - Polymerization - Solutions - Vapor deposition - X ray diffraction;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The electrical breakdown of polyimide (PI) thin films was investigated in the thickness range 0.8-2 μm and in the temperature range -100-200°C, by taking advantage of self-healing. Two kinds of PI films were formed by vapor deposition polymerization (VDP) and coating of polyamic acid precursor in solution, VDP and S films, respectively. Breakdown characteristics of the films in the micron thickness range can be divided into two temperature regions. In the high-temperature region, the thermal process is operative and in the low-temperature region, the avalanche process seems to be predominant probable as compared with the thermal process. The breakdown characteristics were compared between VDP and S films. The results were explained with reference to the infrared reflection absorption spectroscopy of PI which indicates the crystallization and the molecular orientation of VDP film.

引用

页码：6235 / 6239

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