Optical emission spectroscopy of high density metal plasma formed during magnetron sputtering

被引：0
|
作者：
SEH America, Vancouver, United States [1 ]
机构：
来源：
J Vac Sci Technol B | / 2卷 / 202-208期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
    Pajdarova, Andrea Dagmar
    Vlcek, Jaroslav
    Rezek, Jiri
    JOURNAL OF APPLIED PHYSICS, 2017, 121 (17)
  • [22] Influence of Discharge Power on the Intensities of Ar and Ti in High-Pressure Magnetron Sputtering Plasma Measured Using Optical Emission Spectroscopy
    How, Soo Ren
    Nayan, Nafarizal
    Lias, Jais
    2016 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS (ICSE) PROCEEDINGS, 2016, : 236 - 239
  • [23] Estimation of Plasma Parameters in Vanadium Magnetron Sputtering Using Optical Emission Spectroscopy at Different Experimental Formation Conditions
    Khalaf, Mohammed K.
    Al-Gaffer, Alaa N. A.
    Mohsin, Harakat R.
    8TH INTERNATIONAL CONFERENCE ON APPLIED SCIENCE AND TECHNOLOGY (ICAST 2020), 2020, 2290
  • [24] Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition
    Metawa, A. E.
    El-Hossary, F. M.
    Raaif, M.
    SalahEl-Deen, M.
    Abd El-Moula, A. A.
    CHINESE JOURNAL OF PHYSICS, 2020, 68 : 168 - 177
  • [25] Plasma parameters of very high target power density magnetron sputtering
    Posadowski, WM
    THIN SOLID FILMS, 2001, 392 (02) : 201 - 207
  • [26] Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas
    Lopez, J
    Zhu, W
    Freilich, A
    Belkind, A
    Becker, K
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (11) : 1769 - 1780
  • [27] Investigation on optical emission spectra during ECR plasma enhanced magnetron sputtering carbon nitride film deposition
    Xu, J
    Ma, TC
    Zhang, JL
    Deng, XL
    Zhang, WF
    Perrone, A
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2002, 16 (6-7): : 1120 - 1126
  • [28] Optical emission spectroscopy study of magnetron assisted Ni-Ti dc sputtering
    Silva, Marcia
    Gordo, Paulo R.
    Maneira, Manuel
    Fernandes, F. M. Braz
    ADVANCED MATERIALS FORUM III, PTS 1 AND 2, 2006, 514-516 : 1274 - 1278
  • [29] Deposition of alumina films by inverted cylindrical magnetron sputtering assisted by optical emission spectroscopy
    Khanna, Atul
    Bhat, Deepak G.
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2017, 55 (01) : 19 - 24
  • [30] Plasma emission correction in reflectivity spectroscopy during sputtering deposition
    Gozhyk, Iryna
    Dai, Letian
    Herault, Quentin
    Lazzari, Remi
    Grachev, Sergey
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (09)
12345