Investigation of the Defect Formation Processes in the Surface Layers of CaF2 under Electron and Ion Bombardment

被引：0
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作者：
Alidzhanov, E.K. [1 ]
Atabaev, B.G. [1 ]
Gaipov, C. [1 ]
Boltaev, N. [1 ]
机构：
[1] Inst Elektroniki AN RUz, Tashkent, Uzbekistan
来源：
Poverkhnost Rentgenovskie Sinkhronnye i Nejtronnye Issledovaniya | 1995年 / 06期
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页码：109 / 115
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