A novel photosensitive porous low-k interlayer dielectric film

被引：0
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作者：
Kuroki, Shin-Ichiro [1 ]
Sakamoto, Susumu [1 ]
Kikkawa, Takamaro [1 ]
机构：
[1] Res. Ctr. for Nanodevices/Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima 739-8527, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2004年 / 43卷 / 4 B期
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页码：1820 / 1824
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