Properties of Fe(001) single-crystal films grown by sputter beam method

被引：0
|
作者：
Okamoto, Satoshi [1 ]
Kitakami, Osamu [1 ]
Shimada, Yutaka [1 ]
机构：
[1] Tohoku Univ, Sendai, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 11期
关键词：
Interfacial diffusion - Ion beam sputtering - Optimum etching - Single crystal film synthesis - Single crystal films - Sputter beam method;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：6164 / 6167
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