Fabrication of X-ray mask by using diamond membrane

被引：0
|
作者：
Zhang, Wenhua [1 ]
Ding, Guifu [1 ]
Wang, Qian [1 ]
Xu, Juntao [1 ]
Zhang, Shoubai [1 ]
机构：
[1] Shanghai Jiaotong Univ, Shanghai, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 1998年 / 01期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：37 / 42
相关论文
共 50 条
  • [21] Progress in SiC membrane for X-ray mask
    Shoki, T
    Kurikawa, A
    Kawahara, T
    Sakurai, T
    PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 456 - 461
  • [22] A large format membrane-based x-ray mask for microfluidic chip fabrication
    Wang, L
    Zhang, M
    Desta, Y
    Melzak, J
    Wu, CH
    Peng, ZC
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2006, 16 (02) : 402 - 406
  • [23] THICKNESS INHOMOGENEITY DURING SILICON X-RAY MASK MEMBRANE FABRICATION - GENERATION AND PREVENTION
    LOCHEL, B
    MACIOSSEK, A
    KONIG, M
    HUBER, HL
    MICROELECTRONIC ENGINEERING, 1991, 13 (1-4) : 267 - 270
  • [24] X-ray mask fabrication advancement at the Microlithographic Mask Development Center
    Kimmel, KR
    Hughes, PJ
    ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI, 1996, 2723 : 190 - 197
  • [25] PROXIMITY EFFECT CORRECTION FOR X-RAY MASK FABRICATION
    KURIYAMA, Y
    MORIYA, S
    UCHIYAMA, S
    SHIMAZU, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1994, 33 (12B): : 6983 - 6988
  • [26] Optimization of the refractory x-ray mask fabrication sequence
    Cummings, KD
    Dauksher, WJ
    Johnson, WA
    Laudon, MF
    Engelstad, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 4323 - 4327
  • [27] Optimization of the refractory x-ray mask fabrication sequence
    Cummings, K.D.
    Dauksher, W.J.
    Johnson, W.A.
    Laudon, M.F.
    Engelstad, R.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1996, 14 (06):
  • [28] Fabrication of intermediate mask for deep x-ray lithography
    Sheu J.T.
    Chiang M.H.
    Su S.
    Microsystem Technologies, 1998, 4 (2) : 74 - 76
  • [29] Fabrication of intermediate mask for deep x-ray lithography
    Sheu, JT
    Chiang, MH
    Su, S
    MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 74 - 76
  • [30] Improvement of diamond X-ray mask membrane: optical transmittance, surface roughness and irradiation durability
    SORTEC Corp, Ibaraki, Japan
    Microelectron Eng, 1-4 (207-210):
12345