DIE-TO-DATABASE INSPECTION - AN EFFECTIVE METHOD OF DETECTING AND LOCATING DEFECTS ON RETICLES.

被引：0
|
作者：
Jozefov, Eileen [1 ]
Follis, Steve [1 ]
Ruch, Wayne E. [1 ]
机构：
[1] Harris Semiconductor, Melbourne, FL,, USA, Harris Semiconductor, Melbourne, FL, USA
来源：
| 1600年 / 30期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUIT MANUFACTURE
引用
收藏
相关论文
共 40 条
  • [21] Field results from a new die-to-database reticle inspection platform
    Broadbent, William
    Yokoyama, Ichiro
    Yu, Paul
    Seki, Kazunori
    Nomura, Ryohei
    Schmalfuss, Heiko
    Heumann, Jan
    Sier, Jean-Paul
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV, PTS 1 AND 2, 2007, 6607
  • [22] New OPC verification method using die-to-database inspection - art. no. 615232
    Yang, Hyunjo
    Choi, Jaeseung
    Cho, Byungug
    Hong, Jongkyun
    Song, Jookyoung
    Yim, Donggyu
    Kim, Jinwoong
    Yamamoto, Masahiro
    Metrology, Inspection, and Process Control for Microlithography XX, Pts 1 and 2, 2006, 6152 : 15232 - 15232
  • [23] Precise Pattern Alignment for Die-to-Database Inspection Based on the Generative Adversarial Network
    Nam, Yunhyoung
    Joo, Sungho
    Kwak, Nohong
    Kim, Kihyun
    Kim, Do-Nyun
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2022, 35 (03) : 532 - 539
  • [24] Trainable die-to-database for large field of view e-beam inspection
    Fukuda, Kosuke
    Ouchi, Masanori
    Ishikawa, Masayoshi
    Yoshida, Yasuhiro
    Fukaya, Kaoru
    Kagetani, Ryugo
    Shindo, Hiroyuki
    JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, 22 (02):
  • [25] Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection
    Gao, Weihong
    Zeng, Xuefeng
    Lin, Peter
    Pan, Yan
    Song, Ho Young
    Hoang Nguyen
    Cai, Na
    Chen, Zhijin
    Zafar, Khurram
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXX, 2016, 9778
  • [26] Direct die-to-database electron beam inspection of fused silica imprint templates
    Resnick, D. J.
    Myron, L. J.
    Thompson, E.
    Hasebe, T.
    Tokumoto, T.
    Yan, C.
    Yamamoto, M.
    Wakamori, H.
    Inoue, M.
    Ainley, Eric
    Nordquist, Kevin J.
    Dauksher, William J.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 2979 - 2983
  • [27] Hotspot Management for Spacer Patterning Technology with Die-to-Database Wafer Inspection System
    Hagio, Yoshinori
    Nagahama, Ichirota
    Matsuoka, Yasuo
    Mukai, Hidefumi
    Hashimoto, Kohji
    DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION III, 2009, 7275
  • [28] Advanced die-to-database inspection technique for embedded attenuated phase shift mask
    Yamashita, K
    Isomura, I
    Tsuchiya, H
    Watanabe, T
    Inoue, H
    Endo, S
    Tokita, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 3058 - 3062
  • [29] Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System
    Hashimoto, Kohji
    Usui, Satoshi
    Yoshida, Kenji
    Tanaka, Satoshi
    Kotani, Toshiya
    Nojima, Shigeki
    Nagahama, Ichirota
    Nagano, Osamu
    Matsuoka, Yasuo
    Yamazaki, Yuuichiro
    Inoue, Soichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (07)
  • [30] Results from a new 193nm die-to-database reticle inspection platform
    Broadbent, William H.
    Alles, David S.
    Giusti, Michael T.
    Kvamme, Damon F.
    Shi, Rui-Fang
    Sousa, Weston L.
    Walsh, Robert
    Xiong, Yalin
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII, 2010, 7748
1234