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- [2] Energy flux method for die-to-database inspection of critical layer reticles 22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 935 - 946
- [3] Die-to-database inspection of 256 Mbit DRAMs reticles PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 261 - 266
- [4] Die-to-database mask inspection with variable sensitivity PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
- [5] Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects 19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2003, 5148 : 119 - 127
- [6] The impact of pattern proximity correction on die-to-database inspection PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VII, 2000, 4066 : 479 - 486
- [7] A technique to determine capability to detect adjacent defects during the die-to-database inspection of reticle patterns EMLC 2006: 22ND EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2006, 6281
- [8] Results from a new die-to-database reticle inspection platform PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI, 2004, 5446 : 265 - 278
- [9] Hot spot management with die-to-database wafer inspection system DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION II, 2008, 6925
- [10] A prospective modular platform of the mask pattern automatic inspection using the die-to-database method PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XII, PTS 1 AND 2, 2005, 5853 : 965 - 976